X-ray multi-layer mirror and x-ray exposure apparatus
US7162009B2 · kind B2 · utility
2Cited by
10References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 30, 2004 |
| Grant date | Jan 9, 2007 |
| Priority date | — |
| Expiry date | Sep 1, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K1/062
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An X-ray multi-layer mirror having a reflection characteristic with a wider incident angle range is realized by conducting optimization processing on an Mo/Si alternate layer having a constant thickness. Film thickness distributions of Si layers and Mo layers in the Mo/Si alternate layer are determined by optimization processing for widening the angle reflection characteristic of the Mo/Si alternate layer having the constant thickness, which is a fundamental structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.