Hidehiro Kanazawa
15Patents
6h-index
10Co-inventors
55Inventor score
Filing activity: Mar 18, 1997 → Jan 11, 2006
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6458253B2 | Thin film production process and optical device | Chemistry; Metallurgy | 29 | Expired |
| US5885712A | Anti-reflection film and optical system using the same | Chemistry; Metallurgy | 15 | Expired |
| US6472087B1 | Antireflection film, optical element with antireflection film, and production method of the antireflection film | Physics | 14 | Expired |
| US6261696A | Optical element with substrate containing fluorite as main ingredient, and method and apparatus for producing the optical element | Physics | 8 | Expired |
| US6217719A | Process for thin film formation by sputtering | Chemistry; Metallurgy | 8 | Expired |
| US6396626B1 | Antireflection film and optical element coated with the antireflection film | Physics | 6 | Expired |
| US7229532B2 | Sputtering apparatus | Electricity | 5 | Expired |
| US6383346B2 | Method for forming thin films | Chemistry; Metallurgy | 4 | Expired |
| US7286637B2 | Optical thin film and mirror using the same | Physics | 4 | Expired |
| US6947209B2 | Antireflection film and optical element having the same | Physics | 3 | Expired |
| US7162009B2 | X-ray multi-layer mirror and x-ray exposure apparatus | Physics | 2 | Expired |
| US7041391B2 | Method for forming thin films | Chemistry; Metallurgy | 1 | Expired |
| US7116473B2 | Optical element with antireflection film | Physics | 0 | Expired |
| US7342715B2 | Multilayer film reflector for soft X-rays and manufacturing method thereof | Physics | 0 | Expired |
| US7035000B2 | Antireflection film and optical element having the same | Physics | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.