Sulfonamide compound, polymer compound, resist material and pattern formation method
US7166418B2 · kind B2 · utility
1Cited by
9References
15Claims
0Family size
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Key dates
| Filing date | Sep 2, 2004 |
| Grant date | Jan 23, 2007 |
| Priority date | — |
| Expiry date | Sep 2, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/111
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A base polymer of a resist material includes a unit represented by a general formula of the following Chemical Formula 3:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.