Method for fabricating image sensor with inorganic microlens
US7166484B2 · kind B2 · utility
4Cited by
4References
9Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 25, 2004 |
| Grant date | Jan 23, 2007 |
| Priority date | — |
| Expiry date | Jan 25, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F39/8063
Abstract
The present invention relates to a method for fabricating an inorganic microlens. The method includes the steps of: depositing an inorganic layer on a substrate; forming a hemispherical photoresist pattern on the inorganic layer; and performing a blanket etch-back process to thereby form a hemispherical inorganic microlens.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.