Patent · US Expired

Visualization of photomask databases

US7167185B1 · kind B1 · utility

7Cited by
27References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 24, 2003
Grant dateJan 23, 2007
Priority date
Expiry dateJul 15, 2025

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06T2207/30148
  • WIPO fieldComputer technology
  • WIPO sectorElectrical engineering

Abstract

Faster and more accurate techniques for displaying images are described. The techniques can be applied in various applications that include semiconductor fabrication processes. The invention uses preprocessed images to generate a user-selected image in order to increase the speed of image processing. The invention displays the pixels forming an image using grayscale shading in order to improve the accuracy of displaying the patterns used in photolithography processes. The techniques of the present invention can be used to display images that represent lithography patterns stored within memory devices or to display images captured by inspection or metrology devices.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.