Plasma processing system and apparatus and a sample processing method
US7169254B2 · kind B2 · utility
2Cited by
12References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 11, 2003 |
| Grant date | Jan 30, 2007 |
| Priority date | — |
| Expiry date | Dec 11, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32972
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A plasma processing apparatus having a sample stage disposed inside a vacuum chamber and a plate member disposed opposing to a sample which is placed on the sample stage and supplied with electric power. The sample is processed using a plasma generated between the sample stage and the plate member and a measuring port is disposed at a back side of the plate member. The measuring port includes an optical transmitter which receives light from a surface of the sample, and a seal which vacuum-seals between an atmospheric side and vacuum side of the vacuum chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.