Mitsuru Suehiro
12Patents
7h-index
17Co-inventors
55Inventor score
Filing activity: Jan 8, 1999 → Jul 19, 2007
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6755932B2 | Plasma processing system and apparatus and a sample processing method | Electricity | 269 | Expired |
| US6171438A | Plasma processing apparatus and plasma processing method | Electricity | 35 | Expired |
| US6503364B1 | Plasma processing apparatus | Electricity | 30 | Expired |
| US6815365B2 | Plasma etching apparatus and plasma etching method | Electricity | 29 | Expired |
| US6677167B2 | Wafer processing apparatus and a wafer stage and a wafer processing method | Electricity | 16 | Expired |
| US6549393B2 | Semiconductor wafer processing apparatus and method | Electricity | 9 | Expired |
| US6923885B2 | Plasma processing system and apparatus and a sample processing method | Electricity | 7 | Expired |
| US6537012B2 | Vacuum processing apparatus and a vacuum processing system | Emerging Cross-Sectional Technologies | 6 | Expired |
| US6914005B2 | Plasma etching method | Electricity | 4 | Expired |
| US7169254B2 | Plasma processing system and apparatus and a sample processing method | Electricity | 2 | Expired |
| US7686917B2 | Plasma processing system and apparatus and a sample processing method | Electricity | 2 | Active |
| US6558100B1 | Vacuum processing apparatus and a vacuum processing system | Emerging Cross-Sectional Technologies | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.