Photopolymer composition suitable for lithographic printing plates

US7169534B2 · kind B2 · utility

Assignee

• Kodak Polychrome Graphics Company Ltd. · US

Inventors

• Harald Baumann · Tuttlingen, DE
• Michael Flugel · Osterode, DE
• Udo Dwars · Herzberg, DE
• Hans-Horst Glatt · Munich, DE

Key dates

• Filing date: Nov 28, 2003
• Grant date: Jan 30, 2007
• Expiry date: Jan 22, 2024

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C08G18/7831
• WIPO field: Macromolecular chemistry, polymers
• WIPO sector: Chemistry

Abstract

Radiation-sensitive elements are described whose radiation-sensitive coating comprises both a photopolymerizable oligomer with a biuret structural unit and a photopolymerizable phosphazene oligomer.