Apparatus for releasing pressure in a vacuum exhaust system of semiconductor equipment
US7172731B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 13, 2002 |
| Grant date | Feb 6, 2007 |
| Priority date | — |
| Expiry date | Jan 10, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/1624
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An apparatus for protecting a vacuum system of semiconductor equipment is disclosed. The apparatus comprises a process tool and a gas-exploding unit. The process tool includes a gas reaction chamber, and the process tool is connected with a first gas piping to exhaust a waste gas in the gas reaction chamber. The gas-exploding unit includes a gas-exploding chamber, a gas valve, a pressure sensor, and a gas-exploding device for sealing an opening in a wall of the gas-exploding chamber. The gas-exploding chamber is connected with the first gas piping to receive the waste gas. The waste gas in the gas-exploding chamber is transported to a local scrubber through a second gas piping, and then exhausted to a central scrubber. The pressure sensor is used to detect a pressure in the gas-exploding chamber. While the pressure in the gas-exploding chamber detected by the pressure sensor is larger than a reference value, the process tool is shutdown, and the gas valve is then opened to release the waste gas to the central scrubber through a third gas piping.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.