Monochromator mirror for the EUV-spectral range
US7173759B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 21, 2003 |
| Grant date | Feb 6, 2007 |
| Priority date | — |
| Expiry date | Oct 31, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/0891
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
The invention relates to a monochromator mirror for the EUV-spectral range, provided with a layer arrangement placed on a substrate, comprising a periodic sequence of two individual layers (A, B) made of different material forming a period having a thickness d in the form of a spacer-layer or an absorber-layer, whereby the reflectivity of the second or a higher Bragg-order is used. Said thickness d has a dimensional deviation of a maximum of 3% and the ratio of the layer thickness of the absorber-layer to the period thickness is smaller than the ratio of 0.8 of the used order of the Bragg-Reflexion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.