Static pad conditioner
US7175515B2 · kind B2 · utility
0Cited by
12References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 7, 2004 |
| Grant date | Feb 13, 2007 |
| Priority date | — |
| Expiry date | Jun 7, 2024 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B53/017
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A chemical mechanical polishing apparatus includes a polishing pad. A pad conditioner includes a static conditioner head having a surface area configured to contact and condition the pad. The surface area has a first end proximate to an axis of rotation of the pad and a second end remote from the axis of rotation of the pad. The first end defines a first arc length, and the second end defines a second arc length, where the first arc length and the second arc length are substantially identical.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.