Water and aqueous base soluble antireflective coating/hardmask materials
US7175966B2 · kind B2 · utility
5Cited by
10References
40Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 19, 2003 |
| Grant date | Feb 13, 2007 |
| Priority date | — |
| Expiry date | Mar 10, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/167
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A multilayer lithographic structure which includes a substrate, having on a major surface thereof a first layer including a water and/or aqueous base soluble material which includes Ge, O, and H, and optionally X, wherein X is at least one of Si, N, and F; and disposed on the first layer a second layer which includes an energy photoactive material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.