Method for electron beam-initiated coating for application of transmission electron microscopy
US7180061B2 · kind B2 · utility
7Cited by
8References
16Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 29, 2004 |
| Grant date | Feb 20, 2007 |
| Priority date | — |
| Expiry date | Oct 7, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N1/32
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for preparing a specimen for application of microanalysis thereto includes forming an initial conductive layer over a defined area of interest on a semiconductor substrate, the initial conductive layer formed through an electron beam deposition process. A volume of substrate material surrounding the area of interest is removed, thereby forming the specimen, including said area of interest and said initial conductive layer over the area of interest. The specimen is then removed from the bulk substrate material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.