Exposure apparatus and device manufacturing method
US7180575B2 · kind B2 · utility
11Cited by
3References
9Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 24, 2005 |
| Grant date | Feb 20, 2007 |
| Priority date | — |
| Expiry date | Oct 24, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70291
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus includes a projection optical system for projecting a multigradation pattern onto an object, a spatial modulation element that includes plural, two-dimensionally arranged pixels, and forms an optical image by binary control over each pixel, and a superposing optical system for forming the multigradation pattern by superposing the optical images for each row and/or for each column.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.