Apparatus for wafer inspection
US7180585B2 · kind B2 · utility
5Cited by
3References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 17, 2004 |
| Grant date | Feb 20, 2007 |
| Priority date | — |
| Expiry date | Apr 21, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/9501
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An apparatus for wafer inspection is described, comprising an incident-light illumination device (5) having an illumination axis and an imaging device (9) having an image axis, both of which are inclined with respect to one another and are directed onto a region to be inspected of the surface (42) of a wafer (2). According to the present invention, the apparatus is characterized in that the incident-light illumination device (5) and the imaging device (9, 19) each have associated with them a polarizing means whose transmission axes are oriented at a predetermined angle to one another.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.