Source multiplexing in lithography
US7183565B2 · kind B2 · utility
3Cited by
11References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 2, 2005 |
| Grant date | Feb 27, 2007 |
| Priority date | — |
| Expiry date | Aug 2, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/201
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An illumination system for an extreme ultraviolet (EUV) lithography system may include multiple sources of EUV light. The system may combine the light from the multiple sources when illuminating a mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.