Lithographic apparatus, device manufacturing method, and device manufactured thereby
US7184121B2 · kind B2 · utility
3Cited by
3References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 14, 2004 |
| Grant date | Feb 27, 2007 |
| Priority date | — |
| Expiry date | Nov 7, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70725
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic projection apparatus is presented herein that includes a collision protection system for protecting internal components against damage from a collision. The collision protection apparatus includes at least one damper for applying a braking force and/or for absorbing a collision force, reducing or eliminating any damage to delicate and costly parts. The collision protection apparatus can also monitor the position and velocity of a moving part to determine when a collision is likely to occur.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.