Patent · US Expired

Master-oscillator power-amplifier (MOPA) excimer or molecular fluorine laser system with long optics lifetime

US7184204B2 · kind B2 · utility

14Cited by
9References
52Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 30, 2004
Grant dateFeb 27, 2007
Priority date
Expiry dateAug 11, 2025

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01S3/235
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

The lifetime of optical components used in deep-UV (DUV) excimer laser systems, including systems in a MOPA configuration, can be increased by reducing the intensity of pulses incident upon these components. In one approach, an output pulse can be “stretched” in order to reduce the peak power of the pulse. A pulse stretching component can be used, which can be mounted outside the laser enclosure with a horizontal beam path in order to provide a delay line with a minimum impact on the laser system footprint. The horizontal beam path also can minimize the number of optical components in the arm containing the high power beam. A beamsplitting prism can be used with the delay line to avoid the rapid degradation of coatings otherwise exposed to intense UV beams. The prism can expand the beam in the delay line in order to minimize beam intensity and losses due to reflection.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.