Reticle and optical characteristic measuring method
US7190443B2 · kind B2 · utility
8Cited by
9References
2Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 3, 2002 |
| Grant date | Mar 13, 2007 |
| Priority date | — |
| Expiry date | Jan 12, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/706
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A reticle having a test pattern for measurement of an optical characteristic of a projection optical system has a pattern adapted so that a high frequency component of a spectrum at a pupil plane of the projection optical system is reduced or suppressed. Illumination light is projected to the test pattern of the reticle in one direction or plural directions, and positions of images of the test pattern, formed by the projections in the plural directions, are detected and, based thereon, the optical characteristic of the projection optical system is measured.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.