Patent · US Expired

Polysilane thin films for directly patternable waveguides

US7190871B2 · kind B2 · utility

17Cited by

5References

18Claims

0Family size

Assignee

Massachusetts Institute of Technology · US

Inventors

John Lock · Cambridge, US
Lionel C. Kimerling · Concord, US
Karen K. Gleason · Cambridge, US

Key dates

Filing date	Apr 9, 2003
Grant date	Mar 13, 2007
Priority date	—
Expiry date	Apr 9, 2023

Classification

Technology area (CPC G)Physics
CPC primaryG02B6/132
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A waveguide structure includes a substrate. A layer of high index material includes polysilane, which is patterned using a UV light source to form a waveguide.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.