Apparatus to dry substrates
US7191545B2 · kind B2 · utility
18Cited by
6References
18Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 2, 2005 |
| Grant date | Mar 20, 2007 |
| Priority date | — |
| Expiry date | Jun 2, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67034
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention disclosed herein is an apparatus for drying a substrate. In accordance with the present invention, the apparatus includes a measuring unit to detect a density of IPA vapor at predetermined regions in a process chamber or a pipe. The measuring unit has a radiating unit, a detection unit, and a window unit. The radiating unit transmits infrared-ray in a wavenumber region where light is absorbed by the IPA vapor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.