Ultra high saturation moment soft magnetic thin film
US7192662B2 · kind B2 · utility
5Cited by
2References
7Claims
0Family size
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Key dates
| Filing date | Aug 2, 2004 |
| Grant date | Mar 20, 2007 |
| Priority date | — |
| Expiry date | Jan 24, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/12493
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A plated magnetic thin film of high saturation magnetization and low coercivity having the general form Co100-a-bFeaMb, where M can be Mo, Cr, W, Ni or Rh, which is suitable for use in magnetic recording heads that write on narrow trackwidth, high coercivity media. The plating method that produces the alloy includes four current application processes: direct current, pulsed current, pulse reversed current and conditioned pulse reversed current.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.