Patent · US Expired

System and method for manipulating micro-particles using electromagnetic fields

US7193782B2 · kind B2 · utility

15Cited by
8References
24Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 30, 2003
Grant dateMar 20, 2007
Priority date
Expiry dateDec 30, 2023

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T436/25375
  • WIPO fieldEngines, pumps, turbines
  • WIPO sectorMechanical engineering

Abstract

An optical manipulation system is disclosed that includes an array of focusing elements, which focuses the energy beamlets from an array of beamlet sources into an array of focal spots in order to individually manipulate a plurality of samples on an adjacent substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.