Method for fabricating an interference display unit
US7198973B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 13, 2003 |
| Grant date | Apr 3, 2007 |
| Priority date | — |
| Expiry date | Apr 9, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0007
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for fabricating an interference display unit is provided. A first plate and a sacrificial layer are formed in order on a substrate and at least two openings are formed in the first plate and the sacrificial layer. A photoresist layer is spin-coated on the sacrificial layer and fills the openings. A photolithographic process patterns the photoresist layer to define a support with an arm. A second plate is formed on the sacrificial layer and posts. The arm's stress is released through a thermal process. The position of the arm is shifted and the distance between the first plate and the second plate is therefore defined. Finally, The sacrificial layer is removed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.