Inductively-driven light source for lithography
US7199384B2 · kind B2 · utility
2Cited by
21References
49Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 9, 2004 |
| Grant date | Apr 3, 2007 |
| Priority date | — |
| Expiry date | Aug 26, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/007
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An apparatus for producing light includes a chamber that has a plasma discharge region and that contains an ionizable medium. The apparatus also includes a magnetic core that surrounds a portion of the plasma discharge region. The apparatus also includes a pulse power system for providing at least one pulse of energy to the magnetic core for delivering power to a plasma formed in the plasma discharge region. The plasma has a localized high intensity zone.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.