Integrated low-k hard mask
US7199473B2 · kind B2 · utility
0Cited by
4References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 3, 2005 |
| Grant date | Apr 3, 2007 |
| Priority date | — |
| Expiry date | Jun 13, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Embodiments of the invention provide a device with a hard mask layer between first and second ILD layers. The hard mask layer may have a k value approximately equal to the first and/or second ILD layers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.