Sean King
32Patents
7h-index
30Co-inventors
69Inventor score
Filing activity: Dec 27, 2000 → Apr 29, 2024
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8178436B2 | Adhesion and electromigration performance at an interface between a dielectric and metal | Electricity | 446 | Active |
| US7790631B2 | Selective deposition of a dielectric on a self-assembled monolayer-adsorbed metal | Electricity | 72 | Active |
| US9330963B2 | Conformal low temperature hermetic dielectric diffusion barriers | Electricity | 18 | Active |
| US8143159B2 | Fabrication of interconnects in a low-k interlayer dielectrics | Electricity | 15 | Active |
| US8785261B2 | Microelectronic transistor having an epitaxial graphene channel layer | Electricity | 10 | Active |
| US8120114B2 | Transistor having an etch stop layer including a metal compound that is selectively formed over a metal gate | Electricity | 9 | Active |
| US8461683B2 | Self-forming, self-aligned barriers for back-end interconnects and methods of making same | Emerging Cross-Sectional Technologies | 8 | Active |
| US6974772B1 | Integrated low-k hard mask | Electricity | 7 | Expired |
| US6761625B1 | Reclaiming virgin test wafers | Performing Operations; Transporting | 7 | Expired |
| US7759262B2 | Selective formation of dielectric etch stop layers | Electricity | 6 | Active |
| US9754821B2 | Conformal low temperature hermetic dielectric diffusion barriers | Electricity | 6 | Active |
| US8088665B2 | Method of forming self-aligned low resistance contact layer | Electricity | 5 | Active |
| US7816218B2 | Selective deposition of amorphous silicon films on metal gates | Electricity | 5 | Active |
| US7812455B2 | Interconnect in low-k interlayer dielectrics | Electricity | 5 | Active |
| US8039920B1 | Methods for forming planarized hermetic barrier layers and structures formed thereby | Electricity | 4 | Active |
| US7172960B2 | Multi-layer film stack for extinction of substrate reflections during patterning | Emerging Cross-Sectional Technologies | 3 | Expired |
| US9935002B2 | Conformal low temperature hermetic dielectric diffusion barriers | Electricity | 2 | Active |
| US8399317B2 | Transistor having an etch stop layer including a metal compound that is selectively formed over a metal gate, and method therefor | Electricity | 2 | Active |
| US10301719B1 | Amorphous hydrogenated boron carbide low-k dielectric and method of making the same | Electricity | 1 | Active |
| US11251076B2 | Conformal low temperature hermetic dielectric diffusion barriers | Electricity | 0 | Active |
| US12300537B2 | Conformal low temperature hermetic dielectric diffusion barriers | Electricity | 0 | Active |
| US8674484B2 | Dielectric separator layer | Electricity | 0 | Active |
| US11670545B2 | Conformal low temperature hermetic dielectric diffusion barriers | Electricity | 0 | Active |
| US10763161B2 | Conformal low temperature hermetic dielectric diffusion barriers | Electricity | 0 | Active |
| US7199473B2 | Integrated low-k hard mask | Electricity | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.