Patent · US Expired

Method and apparatus for rotating a semiconductor substrate

US7201808B2 · kind B2 · utility

3Cited by

6References

9Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Ho-Man Rodney Chiu · San Jose, US
Steven Verhaverbeke · San Francisco, US
John Lewis · Sunnyvale, US

Key dates

Filing date	Apr 4, 2003
Grant date	Apr 10, 2007
Priority date	—
Expiry date	May 31, 2023

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T279/25
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

An apparatus that includes a rotatable single wafer holding bracket with one or more wafer supports disposed on the single wafer holding bracket, wherein the one or more wafer supports position a center of a wafer to be off-center from an axis of rotation of the single wafer holding bracket.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.