Process monitoring system for lithography lasers
US7203562B2 · kind B2 · utility
3Cited by
23References
51Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 28, 2004 |
| Grant date | Apr 10, 2007 |
| Priority date | — |
| Expiry date | Aug 7, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/80
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system for a monitoring lithography lasers at integrated circuit fabrication plants. Each laser at each fabrication plant has associated with it a terminal server. With respect to each fabrication plant a central control server unit is in communication with each of the lasers through a local area network. Information from the lasers is collected by the central control server unit and the information is used to provide summary information which is made available in a web site format to interested parties having access authorization.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.