Resistive device and method for its production
US7208814B2 · kind B2 · utility
0Cited by
13References
20Claims
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Key dates
| Filing date | Aug 20, 2004 |
| Grant date | Apr 24, 2007 |
| Priority date | — |
| Expiry date | Jan 6, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S257/904
Abstract
A resistive device includes a resistive region of a semiconductor material that includes a first region and a second region, wherein the first region has a higher dopant concentration than the second region, and wherein a resistance-determining width of a current path through the first region is determined by a portion of a doping boundary between the first region and the second region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.