System for using a two part cover for and a box for protecting a reticle
US7209220B2 · kind B2 · utility
21Cited by
26References
26Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 13, 2005 |
| Grant date | Apr 24, 2007 |
| Priority date | — |
| Expiry date | Dec 13, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/135
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system and method are used to protect a mask from being contaminated by airborne particles. They include providing a reticle secured in a two-part cover. The two part cover includes a removable protection device used to protect the reticle from contaminants. The cover can be held inside a pod or box that can be used to transport the cover through a lithography system from an atmospheric section to a vacuum section. While in the vacuum section, the removable cover can be moved during an exposure process during which a pattern on the reticle can be formed on a wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.