Method for determining wavefront aberrations

US7209241B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Wolfgang Emer · Aalen, DE
• Paul Graeupner · Aalen, DE

Key dates

• Filing date: Mar 27, 2006
• Grant date: Apr 24, 2007
• Expiry date: Mar 27, 2026

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/706
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

In a method for manufacturing an optical imaging system, wavefront aberrations caused by an optical imaging system are determined before and after transporting the optical imaging system. At least some of the aberration parameters which are determined in the preceding determination are used as a given precondition for determining aberration parameters in the subsequent determination. This results in a hybrid method, in which the strength of at least two measurement methods are used in a combined form, and specific weaknesses of any one method are avoided.