Charged-particle multi-beam exposure apparatus
US7214951B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 20, 2004 |
| Grant date | May 8, 2007 |
| Priority date | — |
| Expiry date | Apr 10, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3177
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A charged-particle multi-beam exposure apparatus (1) for exposure of a target (41) uses a plurality of beams of electrically charged particles, which propagate along parallel beam paths towards the target (41). For each particle beam an illumination system (10), a pattern definition means (20) and a projection optics system (30) are provided. The illuminating system (10) and/or the projection optics system (30) comprise particle-optical lenses having lens elements (L1, L2, L3, L4, L5) common to more than one particle beam. The pattern definition means (20) defines a multitude of beamlets in the respective particle beam, forming its shape into a desired pattern which is projected onto the target (41), by allowing it to pass only through a plurality of apertures defining the shape of beamlets permeating said apertures, and further comprises a blanking means to switch off the passage of selected beamlets from the respective paths of the beamlets.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.