Exposure method and apparatus
US7217503B2 · kind B2 · utility
47Cited by
12References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 24, 2002 |
| Grant date | May 15, 2007 |
| Priority date | — |
| Expiry date | Oct 7, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70466
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure method comprising the steps of forming onto a mask that arranges a pattern of a contact hole and a plurality of patterns each being smaller than the contact hole pattern, and illuminating the mask using plural kinds of light so as to resolve the desired pattern without the smaller patterns on a target via a projection optical system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.