Exposure method and apparatus
US7221434B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 28, 2006 |
| Grant date | May 22, 2007 |
| Priority date | — |
| Expiry date | Feb 28, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70641
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure method for an exposure apparatus that exposes a mask pattern onto a plate using a projection optical system includes the steps of obtaining information about flatness of a first mask, condition of an image plane when projecting a pattern of the first mask by using the projection optical system, information about a driving amount of a driving system, which can change an imaging condition on the plate based on the condition of the image plane, and information about flatness of a second mask, changing information about the driving amount by using information about flatness of the first and second masks, and driving the driving system based on changed information about the driving amount of the driving system to project a pattern of the second mask onto the plate using the projection optical system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.