Particle deposition apparatus and methods for forming nanostructures
US7223444B2 · kind B2 · utility
27Cited by
8References
44Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 4, 2001 |
| Grant date | May 29, 2007 |
| Priority date | — |
| Expiry date | May 7, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10N99/05
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A fast method of creating nanostructures comprising the steps of forming one or more electrically-charged regions (5) of predetermined shape on a surface (1) of a first material, by contacting the regions with a stamp for transferring electric charge, and providing electrically charged nanoparticles (7) of a second material, and permitting the particles to flow in the vicinity of the regions, to be deposited on the regions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.