Patent · US Expired

Particle deposition apparatus and methods for forming nanostructures

US7223444B2 · kind B2 · utility

27Cited by
8References
44Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 4, 2001
Grant dateMay 29, 2007
Priority date
Expiry dateMay 7, 2021

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10N99/05
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

A fast method of creating nanostructures comprising the steps of forming one or more electrically-charged regions (5) of predetermined shape on a surface (1) of a first material, by contacting the regions with a stamp for transferring electric charge, and providing electrically charged nanoparticles (7) of a second material, and permitting the particles to flow in the vicinity of the regions, to be deposited on the regions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.