Megasonic immersion lithography exposure apparatus and method
US7224427B2 · kind B2 · utility
59Cited by
1References
31Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 3, 2004 |
| Grant date | May 29, 2007 |
| Priority date | — |
| Expiry date | Nov 29, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A megasonic immersion lithography exposure apparatus and method for substantially eliminating microbubbles from an exposure liquid in immersion lithography is disclosed. The apparatus includes an optical system for projecting light through a mask and onto a wafer.An optical transfer chamber is provided adjacent to the optical system for containing an exposure liquid. At least one megasonic plate operably engages the optical transfer chamber for inducing sonic waves in and eliminating microbubbles from the exposure liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.