David Lu
20Patents
6h-index
14Co-inventors
62Inventor score
Filing activity: Nov 6, 2003 → Sep 4, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7224427B2 | Megasonic immersion lithography exposure apparatus and method | Physics | 59 | Expired |
| US7760144B2 | Antennas integrated in semiconductor chips | Electricity | 10 | Active |
| US8053865B2 | MOM capacitors integrated with air-gaps | Electricity | 9 | Active |
| US8105954B2 | System and method of vapor deposition | Performing Operations; Transporting | 7 | Active |
| US8022458B2 | Capacitors integrated with metal gate formation | Electricity | 7 | Active |
| US7582494B2 | Device structures for reducing device mismatch due to shallow trench isolation induced oxides stresses | Electricity | 6 | Active |
| US8368220B2 | Anchored damascene structures | Electricity | 5 | Active |
| US7259393B2 | Device structures for reducing device mismatch due to shallow trench isolation induced oxides stresses | Electricity | 5 | Expired |
| US8237209B2 | Capacitors integrated with metal gate formation | Electricity | 5 | Active |
| US8134235B2 | Three-dimensional semiconductor device | Electricity | 4 | Active |
| US7501227B2 | System and method for photolithography in semiconductor manufacturing | Physics | 3 | Active |
| US7924397B2 | Anti-corrosion layer on objective lens for liquid immersion lithography applications | Physics | 2 | Expired |
| US7420188B2 | Exposure method and apparatus for immersion lithography | Physics | 2 | Active |
| US8178289B2 | System and method for photolithography in semiconductor manufacturing | Physics | 1 | Active |
| US7462561B2 | Contact structure formed using supercritical cleaning fluid and ALCVD | Electricity | 1 | Expired |
| US8054444B2 | Lens cleaning module for immersion lithography apparatus | Physics | 1 | Active |
| US9698080B2 | Conductor structure for three-dimensional semiconductor device | Electricity | 0 | Active |
| US8822331B2 | Anchored damascene structures | Electricity | 0 | Active |
| US8179516B2 | Protective layer on objective lens for liquid immersion lithography applications | Physics | 0 | Active |
| US9130024B2 | Three-dimensional semiconductor device | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.