Electron source manufacturing apparatus and electron source manufacturing method
US7226331B2 · kind B2 · utility
2Cited by
10References
1Claims
0Family size
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Key dates
| Filing date | Oct 5, 2004 |
| Grant date | Jun 5, 2007 |
| Priority date | — |
| Expiry date | May 19, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2329/00
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In an electron source manufacturing apparatus, the quantity of heat generated from an electron source substrate is measured. A temperature of a support member for the electron source substrate is controlled based on the measured quantity of heat generated. A variation in performances of electron source substrates is suppressed, which increase their life.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.