Plasma generation and processing with multiple radiation sources
US7227097B2 · kind B2 · utility
23Cited by
183References
30Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 7, 2003 |
| Grant date | Jun 5, 2007 |
| Priority date | — |
| Expiry date | Jul 26, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02T10/12
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Plasma-assisted methods and apparatus that use multiple radiation sources are provided. In one embodiment, a plasma is ignited by subjecting a gas in a processing cavity to electromagnetic radiation having a frequency less than about 333 GHz in the presence of a plasma catalyst, which may be passive or active. A controller can be used to delay activation of one radiation source with respect to another.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.