Interference patterning
US7228034B2 · kind B2 · utility
1Cited by
4References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 3, 2003 |
| Grant date | Jun 5, 2007 |
| Priority date | — |
| Expiry date | Jul 1, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70408
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Interference patterning of substrates. An interference pattern including an interference fringe may be generated to illuminate a substrate, the area on the substrate actually illuminated by the interference pattern can be limited, the illuminated area can be displaced across the substrate in a direction crossing the interference fringe, and a substantially constant position of the interference pattern relative to the substrate can be maintained despite the displacement of the illuminated area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.