Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium
US7230682B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 29, 2004 |
| Grant date | Jun 12, 2007 |
| Priority date | — |
| Expiry date | Jul 29, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/706
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure method of forming pattern on object via projection optical system, including deciding optimal adjustment amount of adjustment device which adjusts image forming property of the projection optical system to optimize the image forming property under pattern to be formed and exposure condition of the pattern, based on information related to wavefront aberration of the projection optical system, Zernike Sensitivity Chart corresponding to the pattern and the exposure condition, wavefront aberration variation table that denotes relation between adjustment amount of the adjustment device and change in coefficients of terms in the Zernike polynomial, and restraint condition with respect to the adjustment amount of the adjustment device, and exposing the pattern on the object under the exposure condition via the projection optical system of which the image forming property is adjusted by the adjustment device based on the decided optimal adjustment amount.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.