Catoptric reduction projection optical system and exposure apparatus using the same
US7232233B2 · kind B2 · utility
5Cited by
10References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 29, 2002 |
| Grant date | Jun 19, 2007 |
| Priority date | — |
| Expiry date | Jul 29, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70233
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A catoptric reduction projection optical system that uses light of light with a wavelength of 200 nm or less includes six light-reflecting mirrors arranged from an object side to an image side such that said mirrors basically form a coaxial system, wherein a third mirror in said six mirrors is located at a pupil position of said optical system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.