System and method for feedforward control in thin film coating processes
US7232506B2 · kind B2 · utility
4Cited by
16References
26Claims
0Family size
Assignee
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Key dates
| Filing date | Oct 8, 2004 |
| Grant date | Jun 19, 2007 |
| Priority date | — |
| Expiry date | Oct 8, 2024 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/54
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A system and method for feedforward control in thin film coating processes. A standard PID feedback control system that continuously monitors two or more process variables in a reactive sputtering process is combined with a feedforward control system to improve system performance. The control system enables much faster stabilization of the reactive sputtering process during target start-up, and improves control of the process once a steady-state operating condition has been reached following target start-up.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.