Exposure apparatus, device manufacturing method, pattern generator and maintenance method to check for pixel deterioration
US7233383B2 · kind B2 · utility
2Cited by
6References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 21, 2005 |
| Grant date | Jun 19, 2007 |
| Priority date | — |
| Expiry date | Jul 26, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70691
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus for exposing a predetermined pattern onto an object via a projection optical system includes a pattern generating unit that includes plural pixels, and generates the predetermined pattern by driving the plural pixels, a measuring unit for measuring at least one of optical performance of the pattern generating unit and a driving state of the plural pixels, and a maintenance unit for maintaining the pattern generating unit based on a measuring result by the measuring unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.