Method of optimizing imaging performance

US7233386B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Gerd Reisinger · Oberkochen, DE
• Manfred Maul · Aalen, DE
• Paul Graeupner · Aalen, DE
• Martin Schriever · Aalen, DE
• Ulrich Wegmann · Oberkochen, DE

Key dates

• Filing date: Apr 11, 2005
• Grant date: Jun 19, 2007
• Expiry date: Apr 11, 2025

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70216
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.