Semiconductor cleaning composition comprising an ethoxylated surfactant
US7235516B2 · kind B2 · utility
7Cited by
28References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 15, 2002 |
| Grant date | Jun 26, 2007 |
| Priority date | — |
| Expiry date | Jul 20, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02052
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A substrate surface cleaning liquid medium and a cleaning method using the cleaning liquid medium are capable of removing finely particulate contaminants more efficiently than conventional techniques from substrates for devices in the production of semiconductor devices, display devices, etc., which cleaning liquid medium contains the following ingredients (A), (B), (C), and (D), has a pH of 9 or higher, and a content of ingredient (C) of 0.01 to 4% by weight:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.