Projection optical system and projection exposure apparatus
US7239453B2 · kind B2 · utility
25Cited by
21References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 23, 2006 |
| Grant date | Jul 3, 2007 |
| Priority date | — |
| Expiry date | Jun 23, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70275
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A catadioptric projection optical system includes a first optical system, for receiving light from an object, a second optical system, for forming an image of the object on an image plane, and a third optical system disposed optically between the first optical system and the second optical system. The first, second and third optical systems have a common straight optical axis. The image of the object is projected onto the image plane through a plurality of real intermediate image formations, and a pupil plane of the catadioptric projection optical system is free of a void area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.