Patent · US Expired

Method of fabricating polishing pad having detection window thereon

US7241408B2 · kind B2 · utility

7Cited by
5References
32Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 24, 2006
Grant dateJul 10, 2007
Priority date
Expiry dateApr 24, 2026

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/31
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

The present invention provides a method of fabricating a polishing pad having a detection window thereon. A mold having a cavity therein and a transparent thermosetting plastic part that is incompletely hardened are provided. The transparent thermosetting plastic part is disposed in the mold and a high molecular weight foam is injected into the cavity of the mold. The transparent thermosetting plastic part and the high molecular weight foam are hardened at the same time. After the step of demolding is performed, a polishing pad having a detection window thereon is formed. Moreover, the transparent thermosetting plastic part can be designed to have the central portion thicker than its peripheral portion for preventing deformation that is caused by the material difference of the detection window and other portions of the polishing pad.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.