IV TECHNOLOGIES CO., LTD
40Patents
33Active
40Granted
50Portfolio score
Filing activity: May 14, 2003 → Nov 8, 2022 · 10 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7258602B2 | Polishing pad having grooved window therein and method of forming the same | Performing Operations; Transporting | 23 | Expired |
| US8398461B2 | Polishing method, polishing pad and polishing system | Performing Operations; Transporting | 17 | Active |
| US8870626B2 | Polishing pad, polishing method and polishing system | Performing Operations; Transporting | 10 | Active |
| US7241408B2 | Method of fabricating polishing pad having detection window thereon | Emerging Cross-Sectional Technologies | 7 | Expired |
| US7132070B2 | Method of manufacturing polishing pad | Performing Operations; Transporting | 7 | Expired |
| US7604530B2 | Inlaid polishing pad | Performing Operations; Transporting | 6 | Active |
| US7285233B2 | Method of manufacturing polishing pad | Performing Operations; Transporting | 5 | Expired |
| US7101501B2 | Single-layer polishing pad and method producing the same | Performing Operations; Transporting | 5 | Expired |
| US10040167B2 | Polishing pad, polishing system and polishing method | Performing Operations; Transporting | 4 | Active |
| US7597609B2 | Substrate retaining ring for CMP | Performing Operations; Transporting | 4 | Active |
| US7131901B2 | Polishing pad and fabricating method thereof | Performing Operations; Transporting | 3 | Expired |
| US8496512B2 | Polishing pad, polishing method and method of forming polishing pad | Performing Operations; Transporting | 2 | Active |
| US8016647B2 | Polishing pad and method thereof | Emerging Cross-Sectional Technologies | 2 | Active |
| US8393936B2 | Substrate retaining ring for CMP | Performing Operations; Transporting | 2 | Active |
| US8609001B2 | Method of manufacturing polishing pad having detection window | Performing Operations; Transporting | 2 | Active |
| US10421173B2 | Base layer, polishing pad with base layer, and polishing method | Performing Operations; Transporting | 2 | Active |
| US9969049B2 | Polishing layer of polishing pad and method of forming the same and polishing method | Performing Operations; Transporting | 1 | Active |
| US10239182B2 | Polishing pad and polishing method | Performing Operations; Transporting | 1 | Active |
| US8118645B2 | Polishing method, polishing pad, and polishing system | Performing Operations; Transporting | 1 | Active |
| US7335094B2 | Single-layer polishing pad and method of producing the same | Performing Operations; Transporting | 1 | Active |
| US8303378B2 | Polishing pad, polishing method and method of forming polishing pad | Performing Operations; Transporting | 0 | Active |
| US10828745B2 | Polishing pad and polishing method | Performing Operations; Transporting | 0 | Active |
| US8303382B2 | Polishing pad and method of fabrication | Performing Operations; Transporting | 0 | Active |
| US11541505B2 | Polishing pad, manufacturing method of polishing pad and polishing method | Performing Operations; Transporting | 0 | Active |
| US10478940B2 | Manufacturing method of polishing layer, and polishing method | Performing Operations; Transporting | 0 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.